Espacer

Product Series - Electronics

Espacer Overview

ESPACER It is an aqueous solution without any organic solvent. It’s a weak acidic solution, which is applicable for both type of resist.

A thin film of Espacer is highly conductive, therefore it solves problems related to positional errors during electron-beam (EB) lithography processes.

ESPACER 300Z is a Charge Dissipating Agent for Electron Beam Lithography (E-Beam) for positive tone Electron Beam Resists (e.g: ZEP520A PMMA).

Characteristics

  • It is used as a film for Electrification Dissipating Material this contains the original conducting polymer.
  • The thin film of ESPACER has a high conductivity; therefore, it solves the problem about the positional error on the electron-beam (EB) lithography process
  • It has an excellent charge dissipating effect with sheet resistance 7 x 105 ohm/sq at 20 nm thickness and conductivity of 0.7 S/cm.
  • It has no adverse effect on resolution of resists.
  • It can be applied not only onto conventional resists but also onto chemically amplified resists.
  • There are cases where it can protect the resist as an acidic polymer film.
  • The spun film has sufficient heat resistance in practical uses
  • Water alone is used as solvent.
  • It has neither a flash point, nor an ignition point, nor flammable limits
  • It can be easily removed with water after exposure

Grade List

  Non Chemical Amplified Chemical Amplified
  Positive
Resist
Positive
Resist
Negative
Resist
Positive
Resist
Negative
Resist
Negative
Resist
Espacer ZEP520 PMMA FOC-1X FEP-71 SAL601 NEB22
300Z        
300HX02          
300AX01      

Showa Denko Singapore is the sole distributor of this product in South East Asia.
MOQ: 100g

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