ESPACER™ is an aqueous solution without any organic solvent. It’s a weak acidic solution, which is applicable for both type of resist.
A thin film of ESPACER™ is highly conductive, therefore it solves problems related to positional errors during electron-beam (EB) lithography processes.
ESPACER™ 300Z is a Charge Dissipating Agent for Electron Beam Lithography (E-Beam) for positive tone Electron Beam Resists (e.g: ZEP520A PMMA).